High-Precision ITO Glass Substrates (Indium Tin Oxide Coated Glass)
Product Overview
Chenshi Tech is a premier manufacturer specializing in precision ITO glass substrates engineered for display panels, optoelectronic devices, touch sensors, and electrochemical laboratory research. Indium Tin Oxide (ITO) thin films deposited via magnetron sputtering deliver the industry benchmark for low electrical sheet resistance paired with superior optical transmittance across the visible spectrum.
While our FTO conductive glass substrates excel under high-temperature sintering environments above 500°C, ITO glass provides lower surface roughness, higher electrical conductivity, and superior optical clarity for ambient-temperature electronics. We provide standard display-grade sizes and precision laser-etched custom shapes machined strictly to your CAD and DXF specifications.
Technical Specifications
| Specification / Technical Parameter | Display & Sensor Grade Standards | High-Conductivity Lab Grade |
| Conductive Coating | Indium Tin Oxide (In2O3:SnO2, 90:10 wt%) | Indium Tin Oxide (In2O3:SnO2) |
| Substrate Base Material | High-Clarity Float Glass / Corning Eagle XG | Standard Soda-Lime Float Glass |
| Available Substrate Thicknesses | 0.4 mm, 0.55 mm, 0.7 mm, 1.1 mm | 1.1 mm, 1.8 mm, 2.2 mm, 3.0 mm |
| Sheet Resistance (Rs) Options | 5–7 ohm/sq, 8–10 ohm/sq | 15 ohm/sq, 30–50 ohm/sq, 80–100 ohm/sq |
| Optical Transmittance (at 550 nm) | Greater than 86% to 88% | Greater than 82% to 85% |
| Surface Roughness (Ra) | Under 1.2 nm (Ultra-smooth for spin coating) | Under 2.5 nm |
| Haze Value | Less than 0.5% (High optical transparency) | Less than 1.0% |
| Operating Temperature Range | Continuous up to 300°C (in air) | Continuous up to 300°C |
| Dimensional Tolerance | Plus/minus 0.05 mm (High-speed CNC cutting) |
Plus/minus 0.1 mm |
| Edge Finish | 45-degree safety arris, flat optical polishing |
Fine CNC ground edge |
Thickness Availability & Substrate Grades
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Ultra-Thin Substrates (0.4 mm & 0.55 mm): Lightweight glass suited for mobile touch displays, wearable medical sensors, and compact optoelectronic packaging.
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Standard Sensor Thickness (0.7 mm & 1.1 mm): The global standard for organic photovoltaic (OPV) research, organic light-emitting diodes (OLED), and electrochromic test cells.
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Structural Plates (1.8 mm to 3.0 mm): Heavy-duty conductive plates designed for transparent heating elements, electromagnetic interference (EMI) shielding windows, and liquid crystal light valves.
Precision Patterning & Custom Fabrication Capabilities
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Laser Scribing & Direct Etching: High-precision laser pattern isolation with isolation kerf widths under 25 microns and electrical insulation resistance exceeding 100 Megaohms, ideal for interdigitated electrode arrays.
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Photolithographic Wet Chemical Etching: Custom conductive circuit traces, transparent capacitive buttons, and multi-channel biosensor layouts with sharp edge definition.
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CNC Edge Grinding & Drilling: Precision 2.5D C-edge beveling, round polishing, stepped rims, and ultrasonic hole drilling for clean terminal pin feedthroughs.
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Cleanroom Washing & Surface Passivation: Multi-tank ultrasonic surfactant cleaning and DI water rinsing to deliver hydrocarbon-free surfaces ready for direct organic layer coating.
Core Applications & Industry Sectors
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OLED & Perovskite LED Displays: Low-resistance transparent anode layers providing uniform hole injection and high luminous output.
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Liquid Crystal Devices (LCD & PDLC): Transparent conductive electrode panels for active matrix displays and polymer-dispersed liquid crystal smart dimming films.
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Electrochemical Biosensors: Disposable microfluidic sensor slides, cyclic voltammetry working electrodes, and lab-on-a-chip diagnostic devices.
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Electromagnetic Shielding (EMI/RFI): Transparent shielding viewports for avionics displays, military consoles, and sensitive electronic test housings.
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Touch Screen Panels: Capacitive and resistive touch interface glass requiring high touch sensitivity and optical clarity.
Frequently Asked Questions (FAQ)
Q: What is the primary operational difference between ITO Glass and FTO Glass?
A: ITO glass offers superior optical clarity, lower surface roughness, and lower sheet resistance at thinner film thicknesses, making it the premier choice for OLEDs, touch screens, and flat-panel displays. FTO glass is engineered for high-temperature resistance up to 550°C–600°C, making FTO ideal for perovskite solar cells and sintered metal oxide films.
Q: What is the maximum processing temperature for ITO glass substrates?
A: We recommend an upper operating limit of 300°C in atmospheric air. Exceeding 350°C may cause thermal oxidation of the conductive layer, resulting in increased sheet resistance and decreased visible transparency.
Q: Can you fabricate custom patterned electrodes based on CAD files? A: Yes. We offer precision photolithography and high-speed laser ablation using customer-provided CAD (DXF, DWG) drawings, achieving boundary tolerances within plus or minus 10 microns.
Q: How should ITO glass substrates be cleaned before film deposition?
A: Substrates should be ultrasonically cleaned using an alkaline detergent solution, rinsed thoroughly in deionized (DI) water, rinsed in isopropyl alcohol (IPA), and finally treated with UV-ozone or oxygen plasma immediately prior to thin-film spin coating.
