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High Purity JGS1 / JGS2 / JGS3 Quartz Optical Flats & Fused Silica Windows

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High Purity JGS1 / JGS2 / JGS3 Quartz Optical Flats & Fused Silica Windows

Product Description

High Purity JGS1 / JGS2 / JGS3 Quartz Optical Flats & Fused Silica Windows

(Double-Side Precision Polished | 0.1mm–20mm Thickness | Deep-UV to Far-IR Transmission | Custom CNC Fabricated)

1. Product Overview & Engineering Highlights

Our JGS1, JGS2, and JGS3 Optical Quartz Flats and Fused Silica Substrates are engineered for critical applications in high-energy laser optics, UV sterilization, semiconductor lithography, infrared sensing, and extreme-temperature viewports.

Manufactured with high-purity silicon dioxide (>99.99% to >99.9999% SiO2), each substrate is processed with high-precision double-sided optical polishing (down to 20/10 scratch-dig and surface roughness Ra < 0.3 nm). Ranging from 0.1mm ultra-thin optical membranes up to 20mm pressure-resistant viewports, our quartz plates deliver minimal beam distortion, zero internal bubble inclusion, and maximum spectral throughput. We fabricate custom geometries, hole drillings, step rabbets, and bevels directly from your engineering drawings (CAD, DXF, DWG, STP, PDF).

Full-Band Optical Window Options: From Deep Ultraviolet (185nm) through Visible to Mid/Far-Infrared (3500nm).

Extreme Thermal Shock Resistance: Near-zero thermal expansion coefficient (5.5 x 10^-7 / K); withstands rapid temperature jumps from 1100°C to cold water quenching without fracture.

Continuous High Operating Temperature: Stable continuous service at 1100°C; maximum short-term thermal threshold up to 1300°C.

Super-Polished Surface Flatness: Transmitted wavefront distortion down to Lambda/4 to Lambda/10 with parallelism < 30 arcseconds.

Corrosion & Plasma Resistant: Chemically inert to almost all industrial acids and halogens (except hydrofluoric acid), making it an ideal choice for semiconductor etching chambers.

2. JGS1 vs. JGS2 vs. JGS3 Optical Grade Comparison Table

Property / Feature JGS1 (Synthetic Fused Silica) JGS2 (Optical Fused Quartz) JGS3 (Infrared Fused Quartz)
Material Base Synthetic SiCl4 (Gas Phase Synthesis) Natural High-Purity Quartz Crystal Gas-Refined / Dehydroxylated Quartz
SiO2 Purity Level >= 99.9999% (Ultra-high purity) >= 99.99% >= 99.99%
Primary Spectral Band Deep UV to Visible (DUV-VIS) Standard UV to Near-IR Visible to Far-Infrared (VIS-IR)
Transmission Range 185 nm – 2500 nm 220 nm – 2500 nm 260 nm – 3500 nm
UV Cut-off Edge 185 nm (No UV absorption band) 220 nm 260 nm
Hydroxyl (-OH) Content High OH (800 – 1200 ppm) Standard OH (100 – 200 ppm) Near-Zero OH (< 5 ppm)
2.73 um (2730nm) IR Peak Strong absorption dip Moderate absorption dip Completely transparent (No IR dip)
Laser Induced Damage Extremely high threshold High threshold High threshold
Target Application Excimer lasers (193/248/355nm), photomasks, DUV cuvettes Industrial sight glass, furnace windows, general UV optics Infrared sensors, CO2 laser windows, thermal pyrometry

3. Comprehensive Technical Specifications

Parameter Standard Capability & Custom Range
Product Model QTZ-JGS-Series (JGS1 / JGS2 / JGS3)
Thickness Range 0.1mm, 0.2mm, 0.3mm, 0.5mm, 1.0mm, 2.0mm, 3.0mm, 5.0mm, 10mm, 15mm, 20mm
Thickness Tolerance ± 0.01 mm to ± 0.05 mm
Dimensional Tolerance ± 0.02 mm to ± 0.05 mm (Laser dicing / High-speed CNC)
Surface Quality (MIL-PRF-13830B) 60/40 (Commercial), 40/20 (Precision Laser), 20/10 (High Laser Grade)
Surface Roughness (Ra) < 0.5 nm (Super-Polishing down to Ra < 0.2 nm available)
Transmitted Wavefront Error Lambda / 4 to Lambda / 10 @ 632.8 nm
Parallelism / Wedge < 1 arcmin (Precision custom down to < 10 arcsec)
Edge Finish & Chamfer 45° Safety Chamfer, CNC 2.5D C-Edge, R-Edge, Polished Ground Edge
Refractive Index (Nd) 1.4585
Dielectric Strength 25 – 40 kV/mm
Continuous Working Temp 1100°C (Short-term up to 1300°C)

4. Diverse Industrial & Research Application Scenarios

Excimer & Fiber Laser Systems: Laser protective debris windows, beam splitters, focus lens substrates, and optical mirrors for 193nm, 266nm, 355nm, 532nm, and 1064nm wavelengths.

Semiconductor & Photolithography Equipment: Etching chamber sight viewports, wafer carrier trays, UV exposure mask blanks, and high-purity quartz flanges.

Analytical Spectroscopy & Medical Diagnostics: Flow cell windows, UV spectrophotometer cells, fluorescence microscopy coverslips, and endoscopy optical tips.

High-Temperature & High-Pressure Viewports: Vacuum chamber observation ports, chemical reactor inspection glasses, metallurgy sight glass, and autoclave sight ports.

Infrared & Pyrometry Detection (JGS3): Thermal imaging viewports, gas analysis sensor windows, and non-contact pyrometer optical windows.

5. Frequently Asked Questions (FAQ)

Q1: What are the primary differences when choosing between JGS1, JGS2, and JGS3?

A:

JGS1 (Synthetic Fused Silica): Best for Deep UV applications (185nm–220nm). It has virtually no bubble inclusions and extremely low fluorescence.

JGS2 (Natural Fused Quartz): Best balance of cost and performance for UV-Vis-NIR optics (220nm–2500nm) and thermal furnace viewports.

JGS3 (Infrared Quartz): Best for Mid-to-Far IR spectrum (up to 3500nm). Because its hydroxyl (-OH) content is below 5 ppm, it avoids the large absorption dip at 2.73 um common in other quartz grades.

Q2: Can you provide ultra-thin quartz glass with high mechanical precision?

A: Yes. We produce ultra-thin quartz discs and square wafers starting from 0.1mm, 0.15mm, and 0.2mm thickness with tight thickness uniformity (+/- 0.01mm) and polished, chip-free safety edges.

Q3: Can optical coatings (such as Anti-Reflective coatings) be deposited on these quartz substrates?

A: Yes. We offer single-layer and multi-layer dielectric optical coatings, including UV-AR (e.g. 193nm, 248nm, 355nm), VIS-AR (400-700nm), Dual-Band AR, BB-AR (Broadband Anti-Reflective), and High-Reflection (HR) mirror coatings.

Q4: How do you handle custom shapes, bevels, and hole drillings?

A: We support complete custom fabrication from customer CAD drawings (DXF, DWG, STP, STEP, PDF). Capabilities include CNC step-edge milling, countersunk holes, custom corner radii, and waterjet/laser dicing.

6. Cleanroom Packaging & Safe Transit Standards

Ultrasonic Cleanroom Decontamination: All parts undergo multi-stage ultrasonic cleaning with deionized water and are packed in Class 1000 cleanrooms.

Individual Optical Wafer Containers: Thin quartz plates (0.1mm–1.0mm) are secured in dust-proof slotted semiconductor wafer cassettes or gel-pack carrier boxes.

Lint-Free Lens Tissue Interleaving: Medium and thick plates are interleaved with scratch-free optical lens tissue and sealed in anti-static vacuum packs.

Reinforced Cushioning: Packed in high-density pearl cotton (EPE) shock absorbers and shipped in drop-tested, heavy-duty export cartons or wooden crates for zero-breakage global delivery.

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